EFFECTS OF BIAS VOLTAGE ON ADHESION AND PROPERTIES OF CHROMIUM NITRIDE THIN FILMS

Trinh Van Trung, Pham Hong Tuan, Nguyen Thanh Hop, Nguyen Van Thanh

Abstract


Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at bias voltage range from -10 to -100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particularly, the thin films were composed of chromium nitride (CrN, phases of CrN + Cr) and 0.76 mm thick. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of -20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of -100 V led to the delamination of the CrN thin films. The electrochemical test demonstrated that the corrosion resistance in the 3% NaCl solution of CrN coating can be improved.


Keywords


CrN; adhesion, bias voltage; SUS440; hard coating; corrosion resistant

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References


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DOI: http://dx.doi.org/10.12776/ams.v25i4.1356

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SJR 2014: 0.502 - Q2 Metals and Alloys, 39./125.

SJR 2013: 0.309 - Q2 Metals and Alloys, 59./121.       

SJR 2012: 0.325 - Q2 Metals and Alloys, 33./90. (A)

SJR 2011: 0.363 - Q2 Metals and Alloys, 29./90. (A)

SJR 2010: 0.151 - Q3 Metals and Alloys, 68./90. (B)

SJR 2009: 0 - Q4 Metals and Alloys, 89./90. (C - according to the Slovak Journal Quality Criteria)

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IČO 00 397 610

EV 5174/15

p-ISSN 1335-1532, e-ISSN 1338-1156